Battery laser array etching technology
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While fiber lasers, CO2 lasers, and diode lasers can all be used to engrave metal, the kind of laser engraver you need depends on how you want to use it. If you run a production line, you''ll need a fiber laser. If …
Laser Etching: Everything You Need to Know
While fiber lasers, CO2 lasers, and diode lasers can all be used to engrave metal, the kind of laser engraver you need depends on how you want to use it. If you run a production line, you''ll need a fiber laser. If …
Solid-State Nanopore Array: Manufacturing and Applications
2 Manufacturing of Nanopore Array Substrates made of different materials have been used to fabricate the single nanopore or nanopore array structure, such as silicon-based substrates (Si; SiO 2; SiN), glass substrates, alumina membranes, graphene membranes, metal oxide (HfO 2; Al 2 O 3; TiO 2) membranes, polymers (ployimide; polycarbonate; …
Photonics | Free Full-Text | Fiber Bragg Grating Salinity Sensor Array Based on Fiber Tapering and HF Etching …
We propose a seawater salinity sensor array based on a micro/nanofiber Bragg grating structures, which allows for the simultaneous measurement of temperature and salinity. The proposed sensing structure is fabricated through a process involving optical fiber tapering, femtosecond laser inscription, and chemical etching. The equivalent …
Advances in fabrication of micro-optical components by femtosecond laser with etching technology …
In recent years, femtosecond laser with etching technology has proven to be effective for the fabrication of micro-optical components in hard materials owing to their high precision, high surface quality, and ability to fabricate arbitrary 3D structures.
Laser Etching Metal: How To Etch Metal & Which Materials You Can Etch
Laser etching metal: Laser etching is a process of marking a metal by slightly melting its surface with a laser is fast, cheap, and creates high contrast. Fiber vs CO2 lasers: Fiber lasers can etch metals directly, while CO2 lasers need special sprays to etch metals indirectly. ...
Indium-Based Micro-Bump Array Fabrication Technology with Added Pre-Reflow Wet Etching …
Indium-based micro-bump arrays, among other things, are used for the bonding of infrared photodetectors and focal plane arrays. In this paper, several aspects of the fabrication technology of micrometer-sized indium bumps with a smooth surface morphology were investigated. The thermal evaporation of indium has been optimized to …
Laser Etching Post‐Processing to Create Low‐Tortuosity …
In this study, the low-tortuosity structured electrodes with an array grooved structure are fabricated using a method of laser etching post-processing, promoting …
Fabrication and characterization of a tungsten microneedle array based on deep reactive ion etching technology …
In this paper, the authors report on a novel tungsten microneedle array fabricated using deep reactive ion etching. The fabricated sample was 10 mm long, 10 mm wide, and 40 μm ...
Mold Laser Etching Technology: Principles and Applications
Mold laser etching technology utilizes the high energy of laser beams and precise control to achieve high-precision etching on mold surfaces, forming fine patterns and textures. This non-contact processing method offers advantages in efficiency, precision, and repeatability, gradually becoming an important technology in mold …
Etching mechanism of high-aspect-ratio array structure
For instance, while laser etching has been utilized to produce Through-Silicon-Via (TSV), the width of the micro structure is limited to the width of the laser spot. Whereas, the electron-beam technology, which has already provided the basis for a variety of novel and specialized applications in microelectromechanical systems and nano …
Integration of Multifocal Microlens Array on Silicon Microcantilever via Femtosecond-Laser-Assisted Etching Technology…
Integration of Multifocal Microlens Array on Silicon Microcantilever via Femtosecond-Laser-Assisted Etching Micromachines ( IF 3.4) Pub Date : 2022-01-30, DOI: 10.3390/mi13020218
Catalyst-free synthesis of sub-5 nm silicon nanowire arrays with ...
Here, the authors synthesize vertically aligned sub-5 nm silicon nanowires via a vapor phase silicon etching process; the resulting material features unusual lattice …
MobiLase Industrial Fiber Laser | Portable Laser Marking
Laser Source Fiber laser Power Output 30W Standard Marking Area 100 mm x 100 mm Entire Unit Weight ~45 lbs. Laser Handle Weight ~7 lbs. Marking Speed ≤7000 mm/s Repeated Precision 0.01 mm Wavelength 1064±10 nm Frequency Of Pulse 20-80 KHZ
Versatilely tuned vertical silicon nanowire arrays by cryogenic ...
This report demonstrates tunable optimization of inductively coupled plasma reactive ion etching (ICP-RIE) at cryogenic temperature to fabricate vertically …
Laser etching of on-chip ultra-high stability flexible micro …
The micro MnO 2 –Zn flexible battery is constructed using laser etching. The Au/C conductive layer can inhibit the hydrogen evolution to keep a long cycle …
Fabrication of morphology controllable silicon nanostructure array by chemical etching assisted femtosecond laser …
Periodic silicon nanostructure arrays play crucial role in the fields of the optics, nanophotonics and biotechnology. It''s imperative to fabricate controllable silicon nanostructures with high precision and cost-efficiency. In this study, an elegant approach was proposed for fabricating morphology controllable periodic 3D silicon nanostructure …
Chemical etching-assisted femtosecond laser multi-beam rapid preparation of As2Se3 microlens arrays …
In this paper, we primarily used femtosecond laser multi-beam parallel processing technology, complemented by chemical etching technology, to efficiently manufacture infrared microlens arrays with exceptional optical morphology. ...
Micromachines | Free Full-Text | Fabrication of Large-Area Silicon Spherical Microlens Arrays by Thermal Reflow and ICP Etching …
Laser direct writing technology utilizes optical systems to focus a laser beam onto the surface of the workpiece, thus melting and vaporizing the material to fabricate micro/nano structures. Hua et al. [ 30 ] used a femtosecond laser with a wavelength of λ = 343 nm and a pulse duration of t p = 280 fs to directly fabricate a convex MLA on silicon …
Dual modification of current collector for high-performance lithium metal batteries by laser etching …
Dual modification of current collector for high-performance lithium metal batteries by laser etching Author links open overlay panel Xin Zhang, Lujun Huang, Guobo Yang, Jinpeng Song, Guanghui Cong, Shaoshuai Liu, Yating Huang, Zheyuan Liu, Lin Geng Add to ...
Integration of Multifocal Microlens Array on Silicon Microcantilever via Femtosecond-Laser-Assisted Etching Technology …
Herein, we propose a femtosecond-laser-assisted dry etching technology to realize the fabrication of ... Relationship between the depth of the concave microlens array with the laser focus position ...
Micromachines | Free Full-Text | A Review of Femtosecond Laser …
A Review of Femtosecond Laser Processing of Silicon ...
Integration of Multifocal Microlens Array on Silicon Microcantilever via Femtosecond-Laser-Assisted Etching Technology …
In this paper, we proposed a femtosecond-laser-assisted dry etching technology to integrate a multifocal microlens array on the surface of silicon microcantilever, which realizes the integration of micro-optical devices and MEMS devices.
Dual modification of current collector for high-performance lithium metal batteries by laser etching …
The electrochemical behavior of the MCu-Cu x O was investigated by assembling half-cells and cycling at various current density (0.5,1,2 mA cm-2).As shown in Fig. 2 a, MCu-3 shows excellent cycle life with a CE retention above 98% for …
Laser-based three-dimensional manufacturing technologies for ...
Laser three-dimensional (3D) manufacturing technologies have gained substantial attention to fabricate 3D structured electrochemical rechargeable batteries. …
Dual‐Band Laser Selective Etching for Stretchable and Strain Interference‐Free Pressure Sensor Arrays …
This article introduces an advanced fabrication method based on dual-band laser selective etching to create stretchable pressure sensor arrays free from strain interference. An intact sensitive film is sandwiched between the top and bottom electrodes and then etched into separate sensing cells.
Versatilely tuned vertical silicon nanowire arrays by cryogenic reactive ion etching as a lithium-ion battery …
Fabrication routes of vertical silicon (Si) nanowire arrays using different mask materials. Patterning of (a) photoresist, (b) chromium (Cr), and (c) silicon dioxide (SiO2) masks combines ...
Fabrication and characterization of a tungsten microneedle array based on deep reactive ion etching technology
In this paper, the authors report on a novel tungsten microneedle array fabricated using deep reactive ion etching. The fabricated sample was 10 mm long, 10 mm wide, and 40 μm in pitch. Each microneedle had a top-end diameter of 7.7 μm, a bottom-end diameter of 30 μm, a length of 60 μm, and a sidewall tilt angle of approximately 14°. The mechanical …
Overview of atomic layer etching in the semiconductor industry | Journal of Vacuum Science & Technology …
The majority of etch processes in the semiconductor industry today require directional removal, as shown in Fig. 2(a), to maintain critical dimension of the mask. 12,13 The most extensively used process is reactive ion etching (RIE), which is a type of (dry) plasma etching involving a partially ionized plasma glow discharge that provides a …